Equipment

Characterization of materials and devices

Thermogravimetric testing station

Characterization of materials and devices

Nikon optical microscope

Fabrication of materials and structures

TAKATORI WSD‑K2 single‑wire saw (SWS)

Fabrication of materials and structures

Basic ammonothermal GaN crystallization reactors, φ=120 (4 units)

Fabrication of materials and structures

Basic ammonothermal GaN crystallization reactors, φ=100 (12 units)

Fabrication of materials and structures

Basic ammonothermal GaN crystallization reactors, φ=60 (4 units)

Fabrication of materials and structures

Basic ammonothermal GaN crystallization reactors, φ=40 (2 units)

Fabrication of materials and structures

Basic ammonothermal GaN crystallization reactors, φ=20 (5 units)

Characterization of materials and devices

X‑ray diffractometer (XRD)

Fabrication of materials and structures

MBRAUN high‑purity gloveboxes (2 units)

Fabrication of materials and structures

CMP polishing machines (4 units)

Characterization of materials and devices

Delta Technologies X‑ray goniometer for crystal orientation (3 units)