| Name: | Maszyna do polerowania mechaniczno-chemicznego |
| Contact person: | Dr inż. Grzegorz Kamler |
| Laboratory: | NL-3 |
| Location: | ul. Sokołowska 29/37 Warszawa |
Research capabilities and technical data
CMP (Chemical Mechanical Polishing) machines developed at IWC PAS, designed for polishing GaN and other single crystals up to 2 inches in diameter, enabling the achievement of atomically smooth surfaces.